DME8061 is a dry etcher that can achieve non-contact stress relief using plasma.
Improved die strength can be achieved by removing the damaged layer that remains after grinding.
It is possible to switch the processing gas after performing stress relief so that the gettering process* can be performed consecutively.
Metal contamination of the device surface is suppressed by forming a gettering layer on the ground surface.
DME8061 is compatible with MUSUBI, a cluster system that connects multiple equipment units. MUSUBI enables selection of an equipment combination that is suitable for the customer’s manufacturing process. As transfer within the equipment is automated, it is possible to achieve wafer breakage risk reduction and improved throughput.
DMG8762 (grinder/polisher) + DME8061 (dry etcher) + DMM9200 (wafer mounter)
By implementing the plasma stress relief and plasma gettering processes for the die surface using DME8061 after the SDBG® (Stealth Dicing Before Grinding) process, it is possible to achieve both improved die strength and a gettering effect.
| Specification | Unit | DME8061 | |
|---|---|---|---|
| Supported workpiece size | mm | Φ300 | |
| Processing gas | - | SF6, Ar | |
| Equipment dimensions (W×D×H) | mm | 1,400 × 2,200 × 1,800 | |
| Equipment weight | kg | Approx. 2,600 | |
* Customer must prepare a gas abatement system.
* Please read the standard specification sheet before using the equipment.
* Please note that items and specifications may be changed for improvement without prior notice.
| Machine type |
| Spindle |
| C/T |
| Machine dimentions(W × D × H) |
| Machine weight(kg) |
Please feel free to contact us with any questions or inquiries.